KEY FEATURES

• Universality in sample imaging with field-free ultra-high resolution Optics

  • - The BrightBeam™ SEM column delivers field-free ultra-high resolution imaging (0.9 nm at 15 keV, 1.3 nm at 1 keV) while maintaining universality in sample imaging and analysis.
  • - Excellent imaging performance at low-beam energies ideal for imaging non-conducting samples and uncoated biological specimens. A low vacuum mode is also available.
    - High electron beam currents up to 400 nA are advantageous for microanalytical techniques such as CL, EDX, WDX and EBSD.
  • - Detection system with angle-selective and energy-filtering capabilities give complete control of surface sensitivity and the option to explore with different contrast.

Extremely powerful Xe plasma FIB column

Xe plasma ion source FIB column for achieving the most challenging large-scale milling tasks in unbeatable short times frames

• - 50x faster than Ga LMIS FIBs.
• - on beam range current of 1 pA to 3 µA and resolution of  < 12 nm
• - Newly developed high resolution Xe plasma FIB column achieving resolution of < 12 nm for extended patterning capabilities
• - Large-mass xenon ions with larger FIB current range for ultra-fast sputtering even with­out gas-assisted enhancement
• - Significant reduction in ion implantation compared to Ga LMIS FIBs
• - Rocking Stage - An effective and optimized polishing strategy against curtaining effect