LYRA3 is a dual beam system that combines a high-resolution FE-SEM column with a versatile high-performance Ga ion source FIB. LYRA3 is an excellent choice for preparing cross-sections, site-specific high-quality TEM lamella and, high-resolution FIB-SEM tomography for 3D sample reconstructions.
Focused ion beam scanning electron microscope for high-performance in nanoengineering. Download LYRA3 brochure!
PDF – 6.1 MB
High Performance Electron Optics
High brightness Schottky emitter for high-resolution/high current/low-noise imaging
Unique Wide Field Optics™ design with a proprietary Intermediate Lens (IML) offering a variety of working and displaying modes, for instance with enhanced field of view or depth of focus, etc.
Real time In-Flight Beam Tracing™ for performance and beam optimization, integrated with the well-established software Electron Optical Design. It also includes a direct and continuous control of the beam spot size and beam current.
1.2nm at 30keV / 1nm at 30keV (Optional In-Beam detector) 1.5nm at 3keV (Optional Beam Deceleration Mode)
2.0nm at 30keV
1x - 1,000,000x
200eV to 30keV / 50eV to 30kV with BDM option
2pA to 200nA (Optional 2pA to 400nA)
5-axis fully Compucentric stage
High Performance Ion Optics
Sophisticated high performance CANION-FIB system for fast and precise cross-sectioning and TEM sample preparation.
Optional ultra-high resolution COBRA-FIB column represents the highest level of technology in terms of resolution both for imaging and milling. This is one of the most precise FIB instruments for nano-engineering in the world.
2.5nm at 30kV
5.0nm at 30kV
at SEM-FIB coincidence point
1pA to 50nA
1pA to 40nA
0.5kV to 30kV
Minimum 150 × at coincidence point and 10 kV (corresponding to 1 mm field of view), maximum 1,000,000 ×/td>
Semiconductors & Microelectronics
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